The Spectroscopic Ellipsometer is a precision optical metrology system that non-destructively quantifies thin-film thickness and complex refractive indices (ψ, Δ) by analysing polarization state alterations over a spectral range (370-1000nm).
The spectroscopic ellipsometer enables non-destructive, high-precision, optical characterization of thin films by measuring thickness and complex refractive indices (ψ, Δ) over a broad spectral range.
It facilitates advanced multilayer analysis, anisotropic material evaluation, and in situ monitoring for semiconductors and functional coatings.
- Film Thickness
- Film Roughness
- Refractive index(n)
- Extinction Coefficient (k)
- Intensity Reflectance and Transmittance
- Anisotropy
- Mueller-Matrix
- Depolarization
This facility enables precise characterization of multilayer structures, dielectric stacks, and nanoscale coatings in semiconductor fabrication, MEMS devices. The technique is also vital for sensor development and material process optimization.
